原料的功能及控制:

开缸盐: 用于开缸和槽液补充, 提供导电盐, 可以通过对镀液的比重来控制开缸盐含量, 镀液比重最佳值是25, 每提高1个单位需加30g/L开缸盐, 浓度过高会引起镀液结晶, 浓度太低会影响镀液导电性能深圳翻译公司。

Functions and control of raw materials:

Makeup salt: it is used to open the cylinder, replenish bath solution and supply conductive salt. The contents of makeup salt can be controlled by its proportion in plating solution, and the best value is 25. When the proportion is increased by 1, 30g/L makeup salt shall be added. If the concentration is too high, the plating solution will be crystallized; if the concentration is too low, the conductivity of plating solution will be affected.

铬盐: 用于补充镀液中电镀所消耗的铬离子, 补充量为400-600g/1000安培小时, 或根据分析补充。

Chromium salt: it is used to replenish the chromium ions consumed in electroplating, and the recruitment shall be 400-600g/1000 ampere-hours, or according to analysis.

稳定剂: 作用是与三价铬形成稳定的化合物, 浓度过高会影响走位, 浓度过低易出现黑色条纹镀层, 消耗量2000-2500ml/1000安培小时广州翻译公司。

Stabilizer: It is used to form stable compound together with trivalent chromium. If the concentration is too high, the movement will be affected. If the concentration is too low, black stripe will appear on the electroplated layer. The consumption amount of stabilizer is 2000-2500ml/1000 ampere-hours.

湿润剂: 是一种防雾剂, 能提高走位, 浓度过少会出现黑色镀层,  过量一般无影响, 消耗量60-80ml/1000安培小时。

Wetting agent: it is a kind of antifogging agent. It can be used to improve the movement. If the concentration is too low, electroplated layer will become black Excessive wetting agent has no effect. The consumption amount of wetting agent is 60-80ml/1000 ampere-hours.